The facilities and research activities of the University of Wisconsinrsquo;s Center for Xhyphen;ray Lithography (CXrL) are outlined. We discuss recent modifications to the two xhyphen;ray lithography beamlines operated by CXrL at the Aladdin storage ring. Ongoing research in various aspects of xhyphen;ray lithography, including photoresist characterization, mask stability and distortion studies, and modeling of the xhyphen;ray lithography process are summarized. We present plans for the expansion of the CXrL research facilities.
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