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机译:Applicability of a binary amplitude mask for creating correctors of higher-order ocular aberrations in a photoresistive layer
University of Latvia, Institute of Solid State Physics, Kengaraga Street 8, LV-1063, Riga;
University of Latvia, Department of Optometry and Vision Science, Kengaraga Street 8, LV-1063, Riga;
wavefront modulation; ocular aberrations; photoresist; phase plates;