Characterization of TiN films alternately treated with PVD and Cr ion implantation

Oda K.; Tsujioka M.; Nomura T.Ohara H.

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Characterization of TiN films alternately treated with PVD and Cr ion implantation

机译：Characterization of TiN films alternately treated with PVD and Cr ion implantation

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The projected ranges of the conventional ion implantation are generally below submicrons. This makes it difficult to apply the implantation techniques to the tribological uses. The combined process of the physical vapor deposition (PVD) and the ion implantation was developed to form the thick implanted layers over a few microns. In this process, firstly, the PVD films an deposited by the cathodic are ion plating method with a film thickness of 50 to 250 nm. Secondly, the metal ions are implanted using the pulsed are ion source at an energy below 80 keV without mass separation. These two processes were alternately conducted up to the film thickness of a few microns. Using this combined process, Cr implanted PVD-TiN films were studied. The film thicknesses of the implanted layers were 2-7 mu m, which are over ten times larger than those of conventionally implanted layers. Furthermore, these films showed excellent wear resistances compared with the unimplanted PVD-TiN films. (C) 1998 Elsevier Science S.A. All rights reserved. References: 11

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《Materials Chemistry and Physics》 |1998年第3期|266-269|共4页
作者
Oda K.; Tsujioka M.; Nomura T.Ohara H.;
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作者单位

Sumitomo Elect Ind Ltd, Itami Res Labs, 1-1-1 Koya Kita, Itami, Hyogo 664.;

bh.med.kyoto-u.ac.jp;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种英语
中图分类工程材料学;工程基础科学;
关键词
Ion implantation; Physical vapour deposition; Cathodic arc ion plating; Tribology; Tribomechanical properties; Sapphire; Coatings; Stress; Carbon;

Characterization of TiN films alternately treated with PVD and Cr ion implantation

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