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Dielectric multilayer grating designs with maximum diffraction efficiencies

机译:Dielectric multilayer grating designs with maximum diffraction efficiencies

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摘要

Diffraction efficiencies of binary dielectric multilayer gratings are calculated by combining thin film theory and scalar electromagnetic theory, and results are compared with efficiencies of conventional binary gratings, consisting of one single bulk material. By optimizing the number of layers and layer parameters such as material and layer thickness multilayer grating designs are obtained showing diffraction efficiencies in the desired order close to the theoretical maximum and suppressing the zeroth diffraction order effectively. To meet technological requirements of etching processes such as a suitable etch-depth control, parameters of etch-stop layers are included into the calculation and optimization procedure. Manufacturing dielectric multilayer gratings including etch-stop layers will make it possible to obtain uniform etch profiles, a moderate surface roughness in the etched area, and high accuracies in etch depth without any online control devices.#1998 Society of Photo-Optical Instrumentation Engineers. S0091-3286(98)00106-8 Subject terms: multilayer grating designs; etch stop; maximum diffraction effi- ciency; antireflection effects. Paper 31107 received Oct. 20, 1997; revised manuscript received Dec. 26, 1997; accepted for publication Dec. 27, 1997.

著录项

  • 来源
    《Optical Engineering》 |1998年第6期|1696-1702|共7页
  • 作者单位

    Fraunhofer Institut für Angewandte Optik und Feinmechanik Optical Coatings Department/ chillerstrasse 1 D-07745 Jena Germany E-mail frank@iof.fhg.de;

    Universit#t Erlangen-Nurnberg Physikalisches Institut V Lehrstuhl für Optik/ Staudtstrasse 7/B2 D-91058 Erlangen Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 光学仪器;
  • 关键词

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