The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition

Irie M.; Tsujioka M.; Nomura T.Ohara H.

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The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition

机译：The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition

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Nanostructure films, consisting of TiN and Ni, were obtained by filtered vacuum are deposition. The TiN-Ni nanostructure film is expected to have superior mechanical properties. In this method, Ti metal ions and Ni metal ions were alternately introduced to the substrate along a magnetic field sustained in the quarter-torus. The nanoparticle structure and the multilayer structure could be obtained. The TED pattern indicated that the crystallographic orientations of TiN and Ni were aligned, TiN (111)//Ni (111), TiN (100)//Ni (100). The thermal stability of the nanostructure and the film hardness were investigated up to 1053 K. It was confirmed that the nanostructure and the film hardness were stable up to 973 K. The nanostructure was effective for improvement of hardness. (C) 1998 Elsevier Science S.A. All rights reserved. References: 6

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《Materials Chemistry and Physics》 |1998年第3期|317-320|共4页
作者
Irie M.; Tsujioka M.; Nomura T.Ohara H.;
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作者单位

Sumitomo Elect Ind Ltd, Itami Labs, 1-1-1 Koya Kita, Itami, Hyogo 664.;

bh.med.kyoto-u.ac.jp;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种英语
中图分类工程材料学;工程基础科学;
关键词
Titanium nitride; Nanostructure films; Filtered vacuum arc source;

The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition

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