Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

Rung-Ywan Tsai; Sen-Chrong Shiau; Chii-Hua Lee

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Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

机译：Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

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UV-IR cutoff filters consisting a number of alternating layers of TiO↓(2) and SiO↓(2) were prepared by reactive electron-beam deposition (EBD) at a glass-substrate temperature of 300℃and by reactive ion-assisted deposition (lAD) at an ambient substrate temperature. All the filters were prepared in the same coater, equipped with two electron beam guns and one advanced plasma source. The uniformity and reproducibility of filters prepared by both techniques were investigated and compared, and correlated with results from single-layer materials. The useful sample radii, with optical thickness variation less than 1.6, for EBD and lAD filters were up to 50 and 30 cm, respectively. The run-to-run reproducibility of EBD filters was as good as or even better than that of lAD filters. However, the temperature stability of lAD filters was superior to that of EBD filters, which confirmed that the energetic ion bom-bardments made the component films denser. # 1998 Society of Photo-Optical Instrumentation Engineers. S0091-3286(98)03405-9 Subject terms: UV-IR cutoff filters; reactive electron-beam deposition; reactive ion-assisted deposition; advanced plasma source; uniformity; reproducibility; temperature stability. Paper 30097 received Sep. 24, 1997; accepted for publication Dec. 10, 1997.

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来源
《Optical Engineering》 |1998年第6期|1475-1481|共7页
作者
Rung-Ywan Tsai; Sen-Chrong Shiau; Chii-Hua Lee;
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作者单位

Industrial Technology Research Institute Opto-Electronics and Systems Laboratories Building 44,/ 195 Chung Hsing Road, Section 4 Chutung 31015 Taiwan;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种英语
中图分类光学仪器;
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Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

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