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Morphology of AlN formed in aluminum by ion implantation

机译:Morphology of AlN formed in aluminum by ion implantation

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Implantation with nitrogen ions (N-2(+)) accelerated at 150 keV has been performed in high purity aluminum (5 N). The formation of AIN with various dose of 1 x 10(21) to 1 x 10(22) ions m(-2) was investigated using several methods such as a grazing incidence X-ray diffraction analysis (XRD), Auger electron spectroscopy (AES) and transmission electron microscopy. Furthermore, the dynamic ultra-microhardness of the modified surface was evaluated by measuring the penetration depth with an applied load. The forming of AIN in aluminum was identified by the grazing incident XRD. The AES depth profile of nitrogen concentration corresponded to the profile calculated by a theoretical computer simulation. The morphology of formed AIN was not a thin him but dispersive particles. The microhardness increased due to the formation of AIN. The depth of the hardened region was about 100 nm from the aluminum surface. (C) 1998 Elsevier Science S.A. All rights reserved. References: 8

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