Thin films formed by single and dual ion beam deposition of positive and negative ions (Au- and N+)

Heck C.; Tsubouchi N.; Chayahara A.Fujii K.Iwami M.Abiko K.Horino Y.

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Thin films formed by single and dual ion beam deposition of positive and negative ions (Au- and N+)

机译：Thin films formed by single and dual ion beam deposition of positive and negative ions (Au- and N+)

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Ion beam deposition (IBD) is a thin film production method for direct deposition of low-energy mass-analyzed ions. The mass-analyzed beam acts as an exceptionally clean particle source which, when combined with an ultra-high vacuum (UHV) deposition chamber, results in very high purity structures. The IBD technology has been applied for deposition of single Au-, single N+ and dual Au- and Nt depositions on glassy C substrates. For the first time, the growth of Au islands on C by single Au- or dual Au- and N+ deposition is reported. (C) 1998 Elsevier Science S.A. All rights reserved. References: 6

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来源
《Materials Chemistry and Physics》 |1998年第3期|247-250|共4页
作者
Heck C.; Tsubouchi N.; Chayahara A.Fujii K.Iwami M.Abiko K.Horino Y.;
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作者单位

AIST, Osaka Natl Res Inst, 1-8-31 Midorigaoka, Ikeda, Osaka 563.;

bh.med.kyoto-u.ac.jp;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种英语
中图分类工程材料学;工程基础科学;
关键词
Ion beam deposition; Mass analysis; Low energy; High purity; Mass; Ge;

Thin films formed by single and dual ion beam deposition of positive and negative ions (Au- and N+)

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