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首页> 外文期刊>journal of applied physics >Organometallic vaporhyphen;phase epitaxy of Hg1minus;xCdxTe on lcub;211rcub;hyphen;oriented substrates
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Organometallic vaporhyphen;phase epitaxy of Hg1minus;xCdxTe on lcub;211rcub;hyphen;oriented substrates

机译:Organometallic vaporhyphen;phase epitaxy of Hg1minus;xCdxTe on lcub;211rcub;hyphen;oriented substrates

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摘要

Hg1minus;xCdxTe layers have been grown by organometallic vaporhyphen;phase epitaxy at 350thinsp;deg;C on lcub;211rcub;hyphen;oriented substrates, including CdTe, (CdZn)Te, and GaAs, with the emphasis on lattice matching for improved structural quality films. Characterization included optical microscopy, xhyphen;ray diffraction, Fourier transform infrared spectroscopy, and detailed field and temperature Hall measurements. The (211)Bhyphen;oriented epilayers combine the structural quality of (100) including the absence of twinning with the flat topography of (111)Bhyphen;oriented films. The crystal quality improved to that of the substrate with the closer lattice matching of (CdZn)Te, the mismatch taken up with lattice inclination on the high step density surface. A tighter control of the substratesrsquo; Zn content than exists at present is required for ultimate lattice matching to Hg0.2Cd0.8Te. Ashyphen;grown Hg1minus;xCdxTe on (CdZn)Te (211)Bsubstrates isptype with carrier levels in the 1ndash;6 times; 1016hyphen;cmminus;3range for compositions greater than 0.20 and with no indication of mixed conduction behavior due to inversion layers or growthhyphen;related surface or interface layers.

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