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single crystal silicon supported thin film micromirrors for optical applications

机译:single crystal silicon supported thin film micromirrors for optical applications

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摘要

A novel process for fabrication of single crystal it ported torsional micromirrors with large dimensions (300×240) is presented. The mirrors consist of a sputtered aluminum film on a layer of supporting Oxide mounted on fully suspended single crystal silicon grids. The grids have an aspect ratio of 7:1 to provide a stiff backbone and to ensure flatness of the mirror surface. Thus the minors do not bend due to the internal stresses. A new idea of actuation of torsional structures is also presented. Vertical near-comb type actuators were fabricated to drive the torsional structures, # 1997 Society of Photo-Optical Instrumentation En- gineers. S0091-3286(97)01405-0 Subject terms: micro-opto-electro-mechanical systems; micromirrors; vertical ac-tuators; planarization; mechanical polishing; single crystal silicon; single crystal silicon reactive etching and metallization. Paper MEM-11 received Nov. 12, 1996; revised manuscript 1997; accepted for publication Feb. 4, 1997.

著录项

  • 来源
    《Optical Engineering》 |1997年第6期|1408-1413|共6页
  • 作者单位

    Comell University School of Electrical Engineering and Cornell Nanofabrication Facility/ Ithaca, New York 148.53-5401 E-mail: jyao @ dlep 1.itg.ti.com;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类 光学仪器;
  • 关键词

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