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Structural and magnetic properties of high magnetic moment electroplated CoNiFe thin films

机译：高磁矩电镀CoNiFe薄膜的结构和磁性

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摘要

CoNiFe alloy thin films deposited at various cobalt concentrations were galvanostatically electrodepos-ited on the pre-cleaned copper substrates. The effects of cobalt concentration on the structural, compositional, morphological, and magnetic properties of the films were investigated. X-ray diffraction patterns revealed that the deposited films possess polycrystalline in nature with mixed (fcc-bcc) cubic structure at optimized cobalt concentration. Microstructural properties of the films were calculated from predominant diffraction lines. The surface morphology and surface roughness were characterized using scanning electron microscopy and atomic force microscopy, respectively. EDAX results were revealed that the cobalt content increases as nickel content decreases whereas ferrous content initially increases and then eventually decreases in the CoNiFe alloy. VSM results show a higher value of saturation magnetization (4πMs) above 2 T with coercivity 154 A/m for films deposited in the optimized deposition condition.
机译：将在各种钴浓度下沉积的CoNiFe合金薄膜通过恒流电沉积在预先清洁的铜基板上。研究了钴浓度对薄膜的结构，组成，形态和磁性的影响。 X射线衍射图表明，沉积的薄膜具有多晶性质，在最佳钴浓度下具有混合的（fcc-bcc）立方结构。由主要的衍射线计算薄膜的微观结构性质。使用扫描电子显微镜和原子力显微镜分别表征表面形态和表面粗糙度。 EDAX结果表明，在CoNiFe合金中，钴含量随镍含量的降低而增加，而铁含量则先升高，然后最终降低。 VSM结果显示，在最佳沉积条件下沉积的薄膜，其2 T以上具有较高的饱和磁化强度（4πMs），矫顽力为154 A / m。

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