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Determination of the spectral behaviour of porous silicon based photodiodes

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Porous silicon (PS) based photodiodes were formed by depositing gold (Au) contacts onto the PS surface. PS was formed from p-silicon substrates under different formation parameters (current density and time of anodization), so PS layers withdifferent porosities and thicknesses were obtained. It was determined the responsivity and the quantum efficiency of these structures in the 200-2500 nm wavelength range, from which it has been observed a different behavior of those diodes depending onthe porosity and thickness of the PS layer. It has also been studied the spectral response from different diodes in which semitransparent conducting films (gold and indium tin oxide) have been deposited onto the PS layer, obtaining a significantimprovement in the photoelectronic properties in the visible and near infrared parts of the spectrum.

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