A generalized numerical model for the phonon-assisted optical interband transition based on the Green's function formalism was developed and implemented to investigate optical processes in germanium and silicon media intended for on-chip light emitter and laser applications. High-fidelity full band structures obtained from the empirical pseudopotential method, self-energies, and the corresponding spectral density functions for the phonon-perturbed electron and holes have been computed numerically as a function of strain, temperature, and doping level. Validation has been carried out by showing the model's ability to accurately reproduce the measured temperature dependent absorption coefficient data for both germanium and silicon. Absorption coefficients, radiative recombination rates of germanium and silicon active media were investigated with different biaxial tensile strain, doping concentrations and injection conditions. Furthermore, when the model is employed to compute the optical gain in strained germanium, we find that the use of tensile strain and high injection are the preferable approaches to obtain population inversion. At the same time, strong absorption from the spin-orbit to the heavy-hole band limits the maximum injection density that can be applied. Finally, when applied to study silicon, the proposed model also successfully reproduces the experimentally observed radiative recombination peak due to the two-phonon process.
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