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机译:
Georgia Inst Technol, Sch Elect & Comp Engn, GT Lorraine, F-57070 Metz, France;
Univ Paris Saclay, CNRS, Lab Photon & Nanostruct, Route Nozay, F-91460 Marcoussis, France;
CNRS, Georgia Tech, UMI 2958, F-57070 Metz, France;
机译:Raman spectra of indium nitride thin films grown by microwavehyphen;excited metalorganic vapor phase epitaxy on (0001) sapphire substrates
机译:Correlation between nucleation layer structure, dislocation density, and electrical resistivity for GaN films grown on a-plane sapphire by metalorganic vapor phase epitaxy
机译:Chemical ordering in wurtzite In↓(x)Ga↓(1-x)N layers grown on (0001) sapphire by metalorganic vapor phase epitaxy
机译:(In,mn)作为稀磁半导体薄膜的铁磁性 由metalorganic Vapor Epitaxy生长