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首页> 外文期刊>Bulletin of the Russian Academy of Sciences. Physics >Indium sputtering upon bombardment with cluster ions
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Indium sputtering upon bombardment with cluster ions

机译:簇离子轰击铟溅射

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摘要

A surface-ionization method is developed for measuring the integral yields of neutral particles sputtered under the effect of ion bombardment. An investigation is performed to compare the integral yield of particles sputtered upon bombarding indium with Bi _m ~+ cluster ions (m = 1-7) in the energy range of 2-10 keV and the secondary ion emission under bombardment with Bi _m ~- cluster ions (m = 1-5) in the energy range of 6-18 keV. A nonadditive increase in the indium sputtering coefficient is observed with an increasing number of atoms in the bombarding clusters.
机译:开发了一种表面电离方法,用于测量在离子轰击作用下溅射的中性粒子的积分产率。进行了一项研究,以比较在2-10 keV能量范围内用Bi _m〜+簇离子(m = 1-7)轰击铟时溅射产生的粒子的整体产率,以及在Bi _m〜-轰击下的二次离子发射。簇离子(m = 1-5)的能量范围为6-18 keV。随着轰击簇中原子数目的增加,观察到铟溅射系数的非累加增加。

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