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Development of ion beam deposition system

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This report refers to our newly developed ion beam deposition system, which utilizes a deposition process module, generally used for production of silicon thin films, and an etching process module that has been developed fully utilizing the Nordiko ion beam technology. This new deposition system is a cluster-tool type, in which the above two modules are combined with the Shimadzu ECR-CVD (electron cyclotron resonance-chemical vapor deposition) module, specifically developed for the production of DLC (diamond-like carbon) thin films. This new system is expected to be widely utilized for the improvement of the process to produce cover layers of GMR (giant magnetoresistance) heads to be employed in the new types of HDDs (hard disk drives).

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