A stigmatic ultraviolet-visible monochromator for use with a high brightness laser driven plasma light source

Jun Feng; J. Nasiatka; Jared WongXumin ChenSergio HidalgoT. VecchioneH. ZhuF. Javier PalomaresH. A. Padmore

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A stigmatic ultraviolet-visible monochromator for use with a high brightness laser driven plasma light source

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Laser driven plasma light sources offer highly intense output in the UV-visible region combined with a source size as small as 100 μm. In order to effectively use the small source size in high brightness applications, a stigmatic monochromator and focusing system must be used. Here we describe a simple brightness preserving optical system that should be useful across a broad range of applications. The output flux of this system is between 6 × 10~(11) ph/s and 4 × 10~(12) ph/s with a spectra resolution of 1.7 nm and field spot size of 0.1 mm from the UV to the VIS spectra range.

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《Review of Scientific Instruments》 |2013年第8期|085114-1-085114-6|共6页
作者
Jun Feng; J. Nasiatka; Jared WongXumin ChenSergio HidalgoT. VecchioneH. ZhuF. Javier PalomaresH. A. Padmore;
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Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA;

Energetiq Technology, Inc, Woburn, Massachusetts 01801, USAInstituto de Ciencia de Materiales de Madrid (CSIC), Sor Juana Ines de la Cruz, 3, 28049 Madrid, Spain;

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A stigmatic ultraviolet-visible monochromator for use with a high brightness laser driven plasma light source

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