Source of accelerated atoms based on the trap with crossed fields (radial electrical and axial magnetic) is considered. Source produces simultaneously intensive (up to 20-50 mA/cm↑(2)) fluxes of accelerated (1 - 10 keV) atoms and slow (up to 100 eV) atoms. Accelerated atoms are formed in source volume due to the ionization of atoms sputtered from cathode surface and their acceleration by discharge radial electrical field and neutralizing inside the plasma. The features of the atomic flux formation and the atomic flux parameters are considered and discussed. Slow and accelerated atom fluxs generated by the source can be used for surface modification such as implantation and film deposition assisted by accelerated atom beam. Experiments on surface modification made with this source are considered and discussed. # 1998 American Institute of Physics. S0034-6748(98)57002-5
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