Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process (vol 35, pg 3919, 1999)

Yagami K.; Sugano S.; Takahashi M.Tsunoda M.

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Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process (vol 35, pg 3919, 1999)

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来源
《IEEE Transactions on Magnetics》 |2000年第3期|612-0|共1页
作者
Yagami K.; Sugano S.; Takahashi M.Tsunoda M.;
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作者单位

Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan.;

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正文语种英语
中图分类磁性材料、铁氧体;
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Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process (vol 35, pg 3919, 1999)

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