Preparation of titanium(IV) oxide film on a hard alumite substrate

Yoshie Ishikawa; Yasunori Hayashi; Yasumichi Matsumoto

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Preparation of titanium(IV) oxide film on a hard alumite substrate

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TiO_2 was deposited onto hard alumite (Al/Al_2O_3/TiO_2) by alternating current electrolysis and precipitation in (NH_4)_2(TiO(C_2O_4)_2) solution at various temperatures, where the hard alumite was prepared by the anodic oxidation of aluminum in sulfuric acid (Al/Al_2O_3). The TiO_2 electrodeposition mainly occurred at temperatures lower than about 50 deg C, while the TiO_2 deposition due to TiO(C_2O_4)_2~(2-) adsorption onto alumina predominantly occurred at temperatures higher than about 50 deg C. The amount of deposited TiO_2 increased with the increase in the deposition temperature, leading to high photocatalytic activity. The deposited TiO_2 at 90 deg C followed by heat-treatment at 550 deg C had an anatase structure and showed a high photocatalytic activity for the decomposition of acetaldehyde even under fluorescent lamp illumination. The Al/Al_2O_3/TiO_2 prepared at 50 deg C was optimal for practical use, because of a relatively high activity and the sufficient adhesion strength between the TiO_2 and the Al/Al_2O_3 substrate due to the presence of the deposited TiO_2 in the pores of the alumina film.

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来源
《Journal of Materials Research》 |2002年第9期|2373-2378|共6页
作者
Yoshie Ishikawa; Yasunori Hayashi; Yasumichi Matsumoto;
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作者单位

Department of Applied Chemistry, Faculty of Engineering, Kumamoto University, Kurokami 2-39-1, Kumamoto 860-8555, Japan;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种英语
中图分类工程材料学;
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1. ChemInform Abstract: A New Electrochemical Method to Prepare Mesoporous Titanium(IV) Oxide Photocatalyst Fixed on Alumite Substrate. [J] . Yasumichi Matsumoto, Yoshie Ishikawa, Minoru NishidaSeiichiro Ii Chem Inform . 2000,第32期

机译：ChemInform Abstract: A New Electrochemical Method to Prepare Mesoporous Titanium(IV) Oxide Photocatalyst Fixed on Alumite Substrate.
2. Preparation of titanium-oxide films by solid-state reactions of titanium/silicon-oxide/silicon structures [J] . Katsuhiro Yokota, Tomoyuki Yamada, Fumiyoshi MiyashitaKiyohito HiraiHiromichi TakanoMasao Kumagai Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films . 1998,第2期

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Preparation of titanium(IV) oxide film on a hard alumite substrate

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