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Noise analysis and reduction in solid-state nanopores

机译:固体纳米孔的噪声分析和减少

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The electrical noise characteristics of ionic current through organic and synthetic nanopores have been investigated. Comparison to proteinaceous alpha-Hemolysin pores reveals two dominant noise sources in silicon nitride nanometre-scale pores: a high-frequency noise associated with the capacitance of the silicon support chip (dielectric noise), and a low- frequency current fluctuation with 1/f (alpha) characteristics (flicker noise). We present a technique for reducing the dielectric noise by curing polydimethylsiloxane (PDMS) on the nanopore support chip. This greatly improves the performance of solid-state nanopore devices, yielding an unprecedented signal-to-noise ratio when observing dsDNA translocation events and ssDNA probe capture for force spectroscopy applications.
机译:已经研究了通过有机和合成纳米孔的离子电流的电噪声特性。与蛋白质的α-溶血素孔比较,发现氮化硅纳米级孔中的两个主要噪声源:与硅支撑芯片的电容相关的高频噪声(介电噪声)和1 / f的低频电流波动α特性(闪烁噪声)。我们提出了一种通过固化纳米孔支撑芯片上的聚二甲基硅氧烷(PDMS)来降低介电噪声的技术。这大大提高了固态纳米孔器件的性能,在观察dsDNA易位事件和用于力谱应用的ssDNA探针捕获时,产生了空前的信噪比。

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