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机译:
Department of Materials Chemistry, Angstrom Laboratory, Uppsala University, Box 538, SE-751 21 Uppsala, Sweden;
机译:The growth characteristics of (001) oriented diamond layers on (111) diamond face via biashyphen;assisted chemical vapor deposition
机译:Mechanism of diamond growth by chemical vapor deposition on diamond (100), (111), and (110) surfaces: Carbonhyphen;13 studies
机译:Growth of nanocrystalline diamond films by biased enhanced microwave plasma chemical vapor deposition: A different regime of growth
机译:a novel approach to Co/CNTs catalyst via chemical vapor deposition of organometallic compounds