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A total concentration method for modeling of deposition

机译:用于沉积模型化的总浓度法

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摘要

This article presents a fixed-mesh total concentration method for modeling of deposition processes. It is adapted from the total concentration method initially proposed for etching process. The total concentration is defined as the sum of the concentration of the to-be-deposited (particles) and deposited materials (deposit). With this definition, the conservation equation for the total concentration, containing the interfacial conditions, can be derived and solved on a fixed mesh. The moving depositing front is captured implicitly by the concentration of the deposited material. The proposed method is validated against known exact solutions for a few one-dimensional deposition problems and solution from the level-set method for a two-dimensional problem. The method is used to investigate two-dimensional deposition without and with fluid flow coupled.
机译:本文提出了一种用于沉积过程建模的固定网格总浓度方法。它是从最初为蚀刻工艺提出的总浓度方法改编而来的。总浓度定义为待沉积(颗粒)和沉积材料(沉积)的浓度之和。有了这个定义,就可以在固定的网格上导出并求解包含界面条件的总浓度守恒方程。移动的沉积前沿被沉积的物质的浓度隐式捕获。针对几个一维沉积问题的已知精确解以及针对二维问题的水平集方法的解,对提出的方法进行了验证。该方法用于研究在没有和有流体耦合的情况下的二维沉积。

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