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机译:
Institut fur Angewandte und Physikalische Chemie, Universitat Bremen, Leobener Strasse UFT, D-28359 Bremen, Germany;
ZMP, Friedrich Alexander Universitat Erlangen-Nurnberg, Dr.-Mack-Strasse 81, D-90762 Furth, Germany;
Physikalische Chemie I, Fakultat fur Chemie, Universitat Bielefeld, Universitatsstrasse 25, D-33615 Bielefeld, Germany;
机译:Novel titanium compounds for metal-organic chemical vapor deposition of titanium dioxide films with an ultrahigh deposition rate
机译:A wide-angle X-ray scattering laboratory setup for tracking phase changes of thin films in a chemical vapor deposition chamber
机译:Properties of high to ultrahigh Si-doped GaN grown at 550 degrees C by flow modulated metalorganic chemical vapor deposition
机译:a novel approach to Co/CNTs catalyst via chemical vapor deposition of organometallic compounds