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机译:
School of Basic Sciences, Indian Institute of Technology Bhubaneswar, Bhubaneswar 751007, India;
Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany;
Department of Metallurgical and Materials Engineering, Indian Institute of Technology Kharagpur, Kharagpur 721302, India;
机译:Amorphization/recrystallization of buried amorphous silicon layer induced by oxygen ion implantation
机译:Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation
机译:Amorphization and recrystallization of yttrium iron garnet under swift heavy ion beams
机译:Iodine Ions mediated Formation of monomorphic single-Crystalline platinum Nanoflowers