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机译:
National Institute of Standards and Technology;
100 Bureau DriVe, Stop 8320,Gaithersburg, Maryland 20899-8320;
机译:ChemInform Abstract: Ab initio Calculations of the Barriers to Rotation in 1,1‐ Difluoroallyl Radical and an Analysis of the Factors That Govern Rotational Barriers in Fluorinated Allylic Radicals
机译:ChemInform Abstract: Kinetic and ab initio Theoretical Study of Hydrogen Atom Abstraction from Thiols by Thiyl Radicals: Basis Rate Expressions for Reactions of Sulfur‐Centered Radicals.
机译:ChemInform Abstract: Does Alkyl Substitution Affect the Si‐H Bond Strength in Silane? Kinetic Studies of the Reactions of Atomic Chlorine and Bromine with Trimethylsilane and an ab initio Investigation.