Ion beam assisted etching of a fluorinated polyimide in order to insert it in an electro-optical system

B. Lucas; C. Moussant

首页> 外文期刊>Synthetic Metals >Ion beam assisted etching of a fluorinated polyimide in order to insert it in an electro-optical system

【24h】

Ion beam assisted etching of a fluorinated polyimide in order to insert it in an electro-optical system

机译：离子束辅助蚀刻氟化聚酰亚胺，以便将其插入电光系统

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Etching of a fluorinated polyimide (6FDA-ODA)was realized by the IBAE (Ion Beam Assisted Etching) techniquewhich uses an inert ion beam (Ar~+ for example) to carry areactive flux (oxygen for example) towards the target. This ionbeam reactive etching enables us to obtained etching rates of about60 nm/min by maintaining a pressure of about 10~-4 Torr in theirradiation chamber.

机译：氟化聚酰亚胺（6FDA-ODA）的蚀刻是通过IBAE（离子束辅助蚀刻）技术实现的，该技术使用惰性离子束（例如Ar〜+）将活性通量（例如氧气）带向目标。这种离子束反应刻蚀使我们能够通过在其辐射室中保持约10〜-4 Torr的压力来获得约60 nm / min的刻蚀速率。

著录项

来源
《Synthetic Metals》 |1999年第3期|共3页
作者
B. Lucas; C. Moussant;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类工程材料学;黑色金属材料;
关键词
Polymer-Etching-Sputtering-Waveguides; 硫代聚亚胺; 置入; 电光体系; 离子束辅助蚀刻;

机译：Polymer-Etching-Sputtering-Waveguides;硫代聚亚胺;置入;电光体系;离子束辅助蚀刻;

相似文献

外文文献
中文文献
专利

1. Ion beam assisted etching of a fluorinated polyimide in order to insert it in an electro-optical system [J] . Lucas B., Antony R., Moliton A., Synthetic Metals . 1999,第1a3期

机译：离子束辅助蚀刻氟化聚酰亚胺，以便将其插入电光系统
2. Comparison of the etching behavior of GaAs and GaN in a chemically-assisted ion-beam etching system [J] . F. Eberhard, M. Schauler, E. Deichsel Microelectronic Engineering . 1999,第1a4期

机译：在化学辅助离子束刻蚀系统中GaAs和GaN刻蚀行为的比较
3. FABRICATION OF FLUORINATED POLYIMIDE MICROGRIDS USING MAGNETICALLY CONTROLLED REACTIVE ION ETCHING (MC-RIE) AND THEIR APPLICATIONS TO AN ION DRAG INTEGRATED MICROPUMP [J] . Furuya A., Matsuura T., Sawada R., Journal of Micromechanics and Microengineering . 1996,第3期

机译：使用磁控反应离子蚀刻（MC-RIE）及其应用于离子阻力集成微泵的氟化聚酰亚胺微电网的制造
4. Micro-grid fabrication of fluorinated polyimide by using magnetically controlled reactive ion etching (MC-RIE) [C] . Furuya, A., Shimokawa, . 1993

机译：磁控反应离子刻蚀（MC-RIE）的微网格制造氟化聚酰亚胺
5. Studies of the effects of fluorocarbon deposition and etching on silicon and silicon dioxide etching processes using methyl trifluoride in an inductively coupled plasma reactor, and the development of a reactive ion beam system for the study of plasma-surface interaction mechanisms. [D] . Rueger, Neal R. 1998

机译：在感应耦合等离子体反应器中研究碳氟化合物沉积和蚀刻对硅和二氧化硅蚀刻工艺的影响（使用三氟化甲基），并开发了用于研究等离子体与表面相互作用机理的反应离子束系统。
6. Vertically Free-Standing Ordered Pb(Zr0.52Ti0.48)O3 Nanocup Arrays by Template-Assisted Ion Beam Etching [O] . Xiaoyan Zhang, Dan Tang, Kangrong Huang, 2016

机译：模板辅助离子束刻蚀的垂直自由定序Pb（Zr0.52Ti0.48）O3纳米杯阵列
7. Dry-etching and characterization of mirrors on III-nitride laser diodes from chemically assisted ion beam etching [O] . M. Kneissl, D. Hofstetter, D. P. Bour, 2014

机译：通过化学辅助离子束蚀刻对III族氮化物激光二极管的镜面进行干蚀刻和表征
8. Adhesion Enhancement of Thin Copper Film on Polyimide Modified by Oxygen ReactiveIon Beam Etching [R] . Paik, K. W., Ruoff, A. L. 1990

机译：添加到阅览室阅读软件下载与<<氧反应离子束蚀刻改性聚酰亚胺薄膜的增粘作用>>相似的文献

Ion beam assisted etching of a fluorinated polyimide in order to insert it in an electro-optical system

摘要

著录项

相似文献

相关主题

期刊订阅