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Dry Etching for Coherent Refractive Microlens Arrays

机译:用于相干折射微透镜阵列的干蚀刻

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Coherent arrays of refractive micro-optics are fabricated in the surface ofsilicon using a combination of lithographic and reactive-ion etching (RIE) techniques. The aspheric profile can be approximated in a stepwise manner by iterative steps of photolithography and RIE (binary optics technology), by direct etching of a preshaped polymer microlens etch mask into the substrate, or by analog etching of a lens profile directly into the substrate through a pinhole mask. jg.

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