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Large-Area Flexible 3D Optical Negative Index Metamaterial Formed by Nanotransfer Printing

机译:纳米传输印刷形成大面积柔性三维光学负指数超材料

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Negative-index metamaterials (NIMs) are engineered structures with optical properties that cannot be obtained in naturally occurring materials. Recent work has demonstrated that focused ion beam and layer-by-layer electron- beam lithography can be used to pattern the necessary nanoscale features over small areas (hundreds of sq microns) for metamaterials with three-dimensional layouts and interesting characteristics including negative-index behaviour in the optical regime. A key challenge is in the fabrication of such three- dimensional NIMs with sizes and at throughputs necessary for many realistic applications (including lenses, resonators and other photonic components). We report a simple printing approach capable of forming large-area, high-quality NIMs with three-dimensional, multilayer formats. Here, a silicon wafer with deep, nanoscale patterns of surface relief serves as a reusable stamp. Blanket deposition of alternating layers of silver and magnesium fluoride onto such a stamp represents a process for 'inking' it with thick, multilayer assemblies. Transfer printing this ink material onto rigid or flexible substrates completes the fabrication in a high-throughput manner. Experimental measurements and simulation results show that macroscale, three-dimensional NIMs (>75 sq cm) nano-manufactured in this way exhibit a strong, negative index of refraction in the near-infrared spectral range, with excellent figures of merit.

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