首页> 美国政府科技报告 >Development and Verification of Sputtered Thin-Film Nickel-Titanium (NiTi) Shape Memory Alloy (SMA).
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Development and Verification of Sputtered Thin-Film Nickel-Titanium (NiTi) Shape Memory Alloy (SMA).

机译:溅射薄膜镍钛(NiTi)形状记忆合金(sma)的开发与验证。

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This report details the development of a co-sputtering process to yield a shape memory alloy (SMA) film with a controllable composition of nickel-titanium (Ni50Ti50) and transformation temperature around 60 C. Shape memory effects were characterized using differential scanning calorimetry (DSC), for which we demonstrated martensite-austenite phase change at 57 C for 1 3 m films annealed at 600 C for 1 h. We used wafer stress versus temperature measurements as additional confirmation for the repeatable measurement of reversible phase transformation peaking at 73 C upon heating. Up to 62 MPa was available for actuation during the thermally induced phase change. Future work will involve fabricating functional microelectromechanical system (MEMS) devices (i.e., cantilevers, actuators, etc.) based on our Ni50Ti50 SMA.

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