首页> 美国政府科技报告 >Laser Studies of the SiH Radical/Surface Interaction during Deposition of a Thin Film

【24h】

Laser Studies of the SiH Radical/Surface Interaction during Deposition of a Thin Film

机译：薄膜沉积过程中siH自由基/表面相互作用的激光研究

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

This paper presents a new method for studying the interaction of radicals with the surface of a depositing film using a combination of laser spectroscopy and molecular beam techniques. The reactivity of SiH molecules with the surface of a depositing a-Si:H film is measured to be at least 0.95, with no significant dependence on rotational state. 9 refs., 3 figs. (ERA citation 14:012351)

著录项

作者
Ho, P. ; Buss, R. J. ; Breiland, W. G.;
展开▼
作者单位

展开▼
年度 1988
页码 1-15
总页数 15
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Silanes; Chemical Reactions; Fluorescence; Molecular Beams; Molecules; Plasma; Radicals; Spectroscopy; Surface Properties; Surfaces; Thin Films;

机译：硅烷;化学反应;荧光;分子束;分子;等离子体;自由基;光谱学;表面特性;表面;薄膜;

相似文献

外文文献
中文文献
专利

1. Visualizing radical-surface interactions in plasma deposition processes: reactivity of SiH/sub 3/ radicals with Si surfaces [J] . Ramalingam S., Maroudas D. IEEE Transactions on Plasma Science . 1999,第1期

机译：可视化等离子体沉积过程中的自由基-表面相互作用：SiH / sub 3 /自由基与Si表面的反应性
2. Analysis of surface adsorption kinetics of SiH_4 and Si_2H_6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH_4 plasmas [J] . Park Hwanyeol, Yoon Euijoon, Lee Gun-Do, Applied Surface Science . 2019,第Deca1期

机译：使用中压SiH_4等离子体分析氢化硅薄膜沉积SiH_4和Si_2H_6的表面吸附动力学
3. A study on the time evolution of SiH3 surface loss probability on hydrogenated amorphous silicon films in SiH4 rf discharges using infrared diode-laser absorption spectroscopy [J] . Shiratani M., Fukuzawa T., Watanabe Y., Journal of Physics, D. Applied Physics: A Europhysics Journal . 1998,第7期

机译：红外二极管-激光吸收光谱法研究SiH4 rf放电中氢化非晶硅膜上SiH3表面损失几率的时间演化
4. GROWTH MECHANISM OF SI THIN FILM BY PECVD TECHNIQUE: EFFECT OF SIH_3 AND H RADICAL FLUX ON DEPOSITION RATE [C] . Hirotaka Katayama, Isao Yoshida, Akira Terakawa, European Photovoltaic Solar Energy Conference and Exhibition . 2012

机译：PECVD法制备Si薄膜的生长机理：SIH_3和H自由基通量对沉积速率的影响
5. Understanding radical-surface interactions in plasma deposition of silicon thin films through atomistic simulations. [D] . Sriraman, Saravanapriyan. 2003

机译：通过原子模拟了解硅薄膜的等离子体沉积中的自由基-表面相互作用。
6. Deposition of Ultrathin Nano-Hydroxyapatite Films on Laser Micro-Textured Titanium Surfaces to Prepare a Multiscale Surface Topography for Improved Surface Wettability/Energy [O] . Maria Surmeneva, Polina Nikityuk, Michael Hans, 2016

机译：在激光微织构的钛表面上沉积超薄纳米羟基磷灰石薄膜以制备用于改善表面润湿性/能量的多尺度表面形貌
7. PLASMA-OXYGEN INTERACTION DURING THIN FILMS DEPOSITION BY LASER ABLATION: DETERMINATION OF THE INTERACTION PRESSURE THRESHOLD AND EFFECT ON THE THIN FILMS PROPERTIESE [O] . S. Lafane, T. Kerdja, S. Abdelli-Messaci, 2015

机译：激光烧蚀薄膜沉积过程中的等离子体 - 氧相互作用：确定相互作用压力阈值和对薄膜性质的影响
8. Epitaxial growth of oxide thin films on (001) metal surfaces using pulsed-laser deposition [R] . Norton, D. P. , Park, C. , Saffian, B. 1997

机译：使用脉冲激光沉积在（001）金属表面上外延生长氧化物薄膜

Laser Studies of the SiH Radical/Surface Interaction during Deposition of a Thin Film

摘要

著录项

相似文献

相关主题

期刊订阅