Method for Removing Coated Films Such as Photoresist Films

机译：去除诸如光致抗蚀剂膜的涂覆膜的方法

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Disclosed is a method for removing coated films such as photoresist film. CO sub 2 particles are injected and directed against the coated film, which has been prepared directly or indirectly on a substrate surface. (ERA citation 12:025487)

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作者
Hayashi, S.;
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年度 1987
页码 1-8
总页数 8
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Films; Semiconductor Devices; Carbon Dioxide; Manufacturing; Particles; Removal;

机译：薄膜;半导体器件;二氧化碳;制造;颗粒;去除;

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专利

1. Residual Stress Measurement in Coated Plates Using Layer Growing/ Removing Methods: 100th Anniversary of the Publication of Stoney's Paper "The Tension of Metallic Films Deposited by Electrolysis" [J] . J.Koo, J.Valgur Materials science forum . 2011,第期

机译：使用层生长/去除方法测量涂层板中的残余应力：Stoney论文“电解沉积金属膜的张力”发表100周年
2. Fabrication of glass fibers uniformly coated with metal films by magnetron sputtering by a two step process involving fixation by a photoresist [J] . Mingming Lan, Huiqin Li, Dong Wang, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2014,第Null期

机译：磁控溅射通过两步法制备光导纤维均匀涂覆的玻璃纤维，包括用光刻胶固定
3. Removable Composite Electrode Made of Silver Nanoparticles on Pyrolyzed Photoresist Film for the Electroreduction of 4-Nitrophenol [J] . Puyo Maxime, Fau Pierre, Kahn Myrtil L., Langmuir: The ACS Journal of Surfaces and Colloids . 2019,第44期

机译：由银纳米颗粒制成的可移除复合电极在热解的光致抗蚀剂膜上，用于4-硝基苯酚的电胶
4. Residual Stress Measurement in Coated Plates Using Layer Growing/ Removing Methods: 100th Anniversary of the Publication of Stoney's Paper "The Tension of Metallic Films Deposited by Electrolysis" [C] . J. Koo, J. Valgur Residual stresses VIII . 2010

机译：使用层生长/去除方法测量涂层板中的残余应力：Stoney论文发表100周年“电解沉积金属膜的张力”
5. Extreme ultraviolet photoresists: Film quantum yields and LER of thin film resists. [D] . Higgins, Craig. 2011

机译：极紫外光致抗蚀剂：薄膜抗蚀剂的薄膜量子产率和LER。
6. The nanostructuring of surfaces and films using interference lithography and chalcogenide photoresist [O] . Viktor Dan’ko, Ivan Indutnyi, Victor Myn’ko, 2015

机译：使用干涉光刻和硫族化物光刻胶对表面和薄膜进行纳米结构
7. Photoresist Films: Freestanding Photoresist Film: A Versatile Template for Three‐Dimensional Micro‐ and Nanofabrication (Adv. Funct. Mater. 42/2020) [O] . Yuyang Liu, Ke Du, Ishan Wathuthanthri, 2020

机译：光致抗蚀剂薄膜：独立式光致抗蚀剂薄膜：三维微型和纳米制剂的通用模板（ADV。Funct。Matter。42/2020）
8. Aqueous dryfilm photoresist for thin film network pattern gold electroplating. [R] . R. A. Hines 1991

机译：用于薄膜网络图案金电镀的水性干膜光刻胶。

Method for Removing Coated Films Such as Photoresist Films

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