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Spatially Resolved Atomic and Molecular Spectroscopy in Microelectronics Processing Plasmas

机译:微电子加工等离子体中的空间分辨原子和分子光谱

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Plasma processing of microelectronic materials is strongly dependent on the generation and control of neutral radial and ion species generated in a plasma. This abstract reviews our recent measurements of the spatial distribution of several important atomic and molecular species in inductively coupled plasmas through Cl2/BCl2/Ar-containing gas mixtures. Measured species include the ground state Cl and BCl densities as well as the metastable argon density. The focus of this review is on the experimental techniques and results. In addition to assisting in the development of a fundamental understanding of the important plasma physics, these measurements have been used to benchmark multi-dimensional plasma discharge codes.

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