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Minimizing sulfur contamination and rinse water volume required following a sulfuric acid/hydrogen peroxide clean by performing a chemically basic rinse

机译：通过化学碱性冲洗，在硫酸/过氧化氢清洁后，最大限度地减少硫污染和冲洗水量

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Sulfuric acid hydrogen peroxide mixtures (SPM) are commonly used in the semiconductor industry to remove organic contaminants from wafer surfaces. This viscous solution is very difficult to rinse off wafer surfaces. Various rinsing conditions were tested and the resulting residual contamination on the wafer surface was measured. The addition of small amounts of a chemical base such as ammonium hydroxide to the rinse water has been found to be effective in reducing the surface concentration of sulfur and also mitigates the particle growth that occurs on SPM cleaned wafers. The volume of room temperature water required to rinse these wafers is also significantly reduced.

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Clews, P. J. ; Nelson, G. C. ; Resnick, P. J. ; Matlock, C. A. ; Adkins, C. L. J.;
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年度 1997
页码 1-8
总页数 8
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Semiconductor Devices; Water; Ammonium Hydroxides; Hydrogen Peroxide; Resource Conservation; Sulfuric Acid; Surface Cleaning; Meetings;

机译：半导体器件;水;氢氧化铵;过氧化氢;资源保护;硫酸;表面清洁;会议;

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专利

1. Dental Erosion and Sulfuric Ion Exposure Levels in Individuals Working with Sulfuric Acid in Lead Storage Battery Manufacturing Plant Measured with Mouth-rinse Index [J] . Yuji Suyama, Satoru Takaku, Yoshikazu Okawa, The Bulletin of Tokyo Dental College . 2010,第4期

机译：用漱口指数测量铅蓄电池制造厂中使用硫酸的个体的牙齿侵蚀和硫酸离子暴露水平
2. C4: CRITICAL CLEANING FOR CONTAMINATION CONTROL - The Basics of Rinsing - A Case Study [J] . JOHN DURKEE Controlled Environments Magazine . 2010,第9期

机译：C4：污染控制的关键清洁-漂洗的基础-案例研究
3. Complexes of Sulfuric Acid with Hydrogen Chloride, Water, Nitric Acid, Chlorine Nitrate, and Hydrogen Peroxide: An ab Initio Investigation [J] . Peter Beichert, Otto Schrems The journal of physical chemistry, A. Molecules, spectroscopy, kinetics, environment, & general theory . 1998,第51期

机译：硫酸与氯化氢，水，硝酸，硝酸氯和过氧化氢的配合物：从头算研究
4. MINIMIZING SULFUR CONTAMINATION AND RINSE WATER VOLUME REQUIRED FOLLOWING A SULFURIC ACID/HYDROGEN PEROXIDE CLEAN BY PERFORMING A CHEMICALLY BASIC RINSE [C] . P. J. Clews, G. C. Nelson, C. A. Matlock, International Symposium on Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing . 2007

机译：通过进行化学碱性冲洗，最小化硫酸/氢过氧化氢后所需的硫污染和冲洗水体积
5. Hydrogen Production via a Sulfur-Sulfur Thermochemical Water-Splitting Cycle. [D] . AuYeung, Nicholas J. 2011

机译：通过硫-硫热化学水分解循环生产氢。
6. Faecal contamination of water and fingertip-rinses as a method for evaluating the effect of low-cost water supply and sanitation activities on faeco-oral disease transmission. I. A case study in rural north-east Thailand. [O] . J. V. Pinfold 1990

机译：粪便中水和指尖的污染是评估低成本供水和卫生活动对粪便-口腔疾病传播的影响的一种方法。 I.泰国东北农村的一个案例研究。
7. Dental Erosion and Sulfuric Ion Exposure Levels in Individuals Working with Sulfuric Acid in Lead Storage Battery Manufacturing Plant Measured with Mouth-rinse Index [O] . Suyama, Y, Takaku, S, Okawa, Y, 2010

机译：使用漱口水指数测量铅蓄电池制造厂中使用硫酸的个人的牙齿侵蚀和硫离子暴露水平

Minimizing sulfur contamination and rinse water volume required following a sulfuric acid/hydrogen peroxide clean by performing a chemically basic rinse

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