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Reciprocal space analysis of the initial stages of strain relaxation in SiGe epilayers

机译：siGe外延层应变松弛初始阶段的倒易空间分析

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Metastable SiGe films were grown by MBE on Si (001) substrates and annealed to promote varying degrees of partial relaxation. X-ray diffraction reciprocal-space analysis was then used to monitor the structural evolution of the displacement fields of the dislocation array with increasing misfit density. The diffuse-x-ray-scattering patterns of the dislocated heterolayers were compared with lineal- misfit densities determined by defect etching, leading to the develop a geometric model which provides a framework for understanding the early-stage evolution of the displacement fields of the dislocation array, and which also explicitly links diffuse x-ray intensity to misfit density. At low misfit density, the diffuse intensity arises from two-dimensional displacement fields associated with single-nonoverlapping dislocations. As misfit density increases, the displacement fields of individual dislocations increasingly overlap producing three-dimensional displacements. The evolving diffuse intensity reflects the transition from 2-D to 3-D displacement fields. Finally, it is demonstrated that the diffuse x-ray intensity of the strained epilayer can be used to accurately measure lineal misfit- dislocation densities from 400 to 20,000 lines/cm.

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