首页> 美国政府科技报告 >Environmentally friendly polysilane photoresists
【24h】

Environmentally friendly polysilane photoresists

机译:环保型聚硅烷光刻胶

获取原文

摘要

Several novel polysilanes synthesized by the free-radical hydrosilation of oligomeric polyphenylsilane or poly(p-tert- butylphenylsilane) were examined for lithographic behavior. This recently developed route into substituted polysilanes has allowed for the rational design of a variety of polysilanes with a typical chemical properties such as alcohol and aqueous base solubility. Many of the polysilane resists made could be developed in aqueous sodium carbonate and bicarbonate solutions. These materials represent environmentally friendly polysilane resists in both their synthesis and processing.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号