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Behavior of hydrogen atoms in boron films during H(sub 2) and He glow discharge and thermal desorption

机译：H（sub 2）和He辉光放电和热解吸过程中硼膜中氢原子的行为

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Hydrogen absorption and desorption characteristics in boron films deposited on a graphite liner have been studied. Number of hydrogen atoms absorbed in the films is estimated from a decrease in hydrogen pressure during a hydrogen glow discharge. It was 1.9 x 10(sup 17) atoms/cm(sup 2) in the 1 hour discharge after an evacuation of H atoms contained in the original boron films by thermal desorption. Hydrogen atoms were absorbed continuously without saturation for 3 hours during the discharge. Number of H atoms absorbed reached to 2.6 x 10(sup 17) atoms/cm(sup 2) at 3 hour. A discharge in helium was carried out to investigate H desorption characteristics from hydrogen implanted boron films. It was verified that reactivity for hydrogen absorption was recovered after the He discharge. Hydrogen atoms were accumulated in the films by repetition of alternate He and H(sub 2) discharge. Thermal desorption experiments have been carried out by raising the liner temperature up to 500degC for films after 1 hour, 3 hours hydrogen discharge and 6 times repetition of H(sub 2)/He discharges. Most of H atoms in the films were desorbed for all these cases. The slow absorption process was confirmed through the thermal desorption experiments. (author).

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