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Double-multilayer monochromator using a modular design for the Advanced Photon Source

机译:采用模块化设计的双层多层单色器,用于高级光子源

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A novel double-multilayer monochromator has been designed for the Advanced Photon Source X-ray undulator beamline at Argonne National Laboratory. The monochromator consists of two ultra high-vacuum (UHV) compatible modular vessels, each with a sine-bar driving structure and a water-cooled multilayer holder. A high precision Y-Z stage is used to provide compensating motion for the second multilayer from outside the vacuum chamber so that the monochromator can fix the output monochromatic beam direction and angle during the energy scan in a narrow range. The design details for this monochromator are presented in this paper.

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