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Thermal Oxidation Preparation of Doped Hematite Thin Films for Photoelectrochemical Water Splitting

机译:光电化学水分解掺杂赤铁矿薄膜的热氧化制剂

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摘要

Sn- or Ge-doped hematite thin films were fabricated by annealing alloyed films for the purpose of photoelectrochemical (PEC) water splitting. The alloyed films were deposited on FTO glass by magnetron sputtering and their compositions were controlled by the target. The morphology, crystalline structure, optical properties, and photocatalytic activities have been investigated. The SEM observation showed that uniform, large area arrays of nanoflakes formed after thermal oxidation. The incorporation of doping elements into the hematite structure was confirmed by XRD. The photocurrent density-voltage characterization illustrated that the nanoflake films of Sn-doped hematite exhibited high PEC performance and the Sn concentration was optimized about 5%. The doped Ge4+ ions were proposed to occupy the empty octahedral holes and their effect on PEC performance of hematite is smaller than that of tin ions.
机译:通过退火的合金薄膜制造Sn-或Ge掺杂的赤铁矿薄膜,用于光电化学(PEC)水分解。通过磁控溅射沉积合金薄膜在FTO玻璃上沉积,并且它们的组合物由靶控制。已经研究了形态,结晶结构,光学性质和光催化活性。 SEM观察显示,在热氧化后形成的均匀,大面积纳米薄片。通过XRD证实了掺杂掺杂元素到赤铁矿结构中。光电流密度 - 电压表征所示的是Sn掺杂赤铁矿的纳米蛋白膜表现出高PEC性能,SN浓度优化约5%。提出了掺杂的GE4 +离子占据空八面体孔,其对赤铁矿PEC性能的影响小于锡离子的影响。

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