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首页> 外文OA文献 >Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography
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Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography

机译：通过部分填充紫外纳米压印光刻技术延长防反射结构模具中脱模剂的使用寿命

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摘要

Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong release force (RF) that deteriorates the release agent and shortens the lifetime of the ARS mold. In this paper, we proposed a technique of partial-filling UV-NIL in order to reduce the RF and consequently, prolong the lifetime of the release agent on ARS mold. The release and optical properties of the ARS were measured to determine the lifetime of the release agent on the mold, and complete-filling UV-NIL was also executed for comparison. By means of partial-filling UV-NIL, we successfully fabricated ARS films with excellent performance up to 75th imprint compared to complete-filling UV-NIL up to the 40th imprint.
机译：脱模剂成为紫外线纳米压印光刻（UV-NIL）中的必要元素，用于防止粘合剂树脂粘附到抗反射结构（ARS）模具的表面。但是，在UV-NIL期间完全填充高纵横比ARS模具的树脂会产生很强的脱模力（RF），从而使脱模剂变质并缩短ARS模具的寿命。在本文中，我们提出了一种部分填充UV-NIL的技术，以减少RF，从而延长ARS模具上脱模剂的寿命。测量ARS的脱模和光学性能，以确定脱模剂在模具上的寿命，并执行完全填充的UV-NIL进行比较。通过部分填充UV-NIL，我们成功地制造了ARS薄膜，与完全填充UV-NIL直至40印记相比，该薄膜具有出色的性能，直至第75印记。

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