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Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image

机译：基于交替相移掩模图像中相邻峰的强度差的光刻投影光学器件的均匀像差测量

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Peng B(彭勃); Wang XZ(王向朝); Qiu ZC(邱自成); Cao YT(曹宇婷); Duan LF(段立峰);
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年度 2010
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1. Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image [J] . Bo Peng, Xiangzhao Wang, Zicheng Qiu, Applied optics . 2010,第15期

机译：基于交替相移掩模图像中相邻峰的强度差的光刻投影光学器件的均匀像差测量
2. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask [J] . Fan Wang, Xiangzhao Wang, Mingying Ma, Applied Optics . 2006,第2期

机译：使用交替相移掩模在光刻工具中测量投影光学器件的像差
3. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask [J] . Fan Wang, Xiangzhao Wang, Mingying Ma, Applied optics . 2006,第2期

机译：通过使用交替相移掩模来测量光刻工具中投影光学的像差
4. ABERRATION MEASUREMENT OF PROJECTION OPTICS IN LITHOGRAPHIC TOOLS BY USE OF PHASE-SHIFTED GRATING MARKS [C] . Mingying Ma, Xiangzhao Wang, Zicheng Qiu, International Conference on Semiconductor Technology . 2007

机译：通过使用相移光栅标记的光刻工具中投射光学器件的像差测量
5. Measuring aberrations in lithographic projection systems with phase wheel targets. [D] . Zavyalova, Lena. 2010

机译：使用相位轮靶测量光刻投影系统中的像差。
6. Single Centre Experience on Decision Making for Mechanical Thrombectomy Based on Single-Phase CT Angiography by Including NCCT and Maximum Intensity Projection Images – A Comparison with Magnetic Resonance Imaging after Non-Contrast CT [O] . Myeong Soo Kim, Gi Sung Kim 2020

机译：包括NCCT和最大强度投影图像在内的基于单相CT血管造影的机械血栓切除术决策的单中心经验–与非对比CT后的磁共振成像比较
7. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [O] . Zicheng Qiu Xiangzhao Wang Qunyu Bi Qiongyan Yuan Bo Peng Lifeng Duan 2009

机译：平移对称交替移相掩模光栅标记在光刻投影像差线性测量模型中的应用

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image

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