首页> 外文OA文献 >Microstructural and Optical Properties of AlxGa1-xN/GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

【2h】

Microstructural and Optical Properties of AlxGa1-xN/GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

机译：等离子体辅助金属有机化学气相沉积法在Si（111）衬底上生长AlxGa1-xN / GaN异质结构薄膜的微观结构和光学性质

页面导航

著录项
相似文献
相关主题

著录项

作者
Heri Sutanto; Agus Subagio; Pepen Arifin; Mohamad Barmawi;
展开▼
作者单位

展开▼
年度 2007
总页数
原文格式 PDF
正文语种 {"code":"en","name":"English","id":9}
中图分类

相似文献

外文文献
中文文献
专利

1. Spatial stress distribution and optical properties of GaN films grown on convex shape-patterned sapphire substrate by metalorganic chemical vapor deposition [J] . Tae Su Oh, Ah Hyun Park, Hyun Jeong Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2011,第6期

机译：金属有机化学气相沉积法在凸形蓝宝石衬底上生长的GaN薄膜的空间应力分布和光学性能
2. Evolution of Threading Dislocation Density and Stress in GaN Films Grown on (111) Si Substrates by Metalorganic Chemical Vapor Deposition [J] . X. WENG, J.D. ACORD, A. JAIN, Journal of Electronic Materials . 2007,第4期

机译：金属有机化学气相沉积在（111）Si衬底上生长的GaN膜中的螺纹位错密度和应力的演变
3. Evolution of Threading Dislocation Density and Stress in GaN Films Grown on (111) Si Substrates by Metalorganic Chemical Vapor Deposition [J] . X. Weng, J. D. Acord, A. Jain, Journal of Electronic Materials . 2007,第4期

机译：金属有机化学气相沉积在（111）Si衬底上生长的GaN膜中的螺纹位错密度和应力的演变
4. Microstructure and Optical Properties of Al_xGa_1-xN/GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method [C] . H. Sutantoa, A. Subagio, E. Supriyanto, International Conference on Neutron and X-Ray Scattering . 2008

机译：通过等离子体辅助金属有机化学气相沉积法在Si（111）衬底上生长的Al_XGA_1-XN / GaN异质结构薄膜的微观结构和光学性质
5. Strontium titanium oxide and barium(1-x) strontium(x) titanium oxide epitaxial thin films grown by plasma-enhanced metalorganic chemical vapor deposition. [D] . Liang, Shaohua. 1995

机译：通过等离子体增强的金属有机化学气相沉积法制得的锶钛氧化物和钡（1-x）锶钛氧化物外延薄膜。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. Optical characterization of Mg-doped GaN films grown by metalorganic chemical vapor phase deposition [O] . Martínez Criado Gema, Cros Stotter Ana, Cantarero Sáez Andrés, 2000

机译：金属有机化学气相沉积法生长掺镁GaN薄膜的光学表征
8. Diamond thin films grown by microwave plasma assisted chemical vapor deposition. [R] . M. Leksono 1991

机译：通过微波等离子辅助化学气相沉积生长的金刚石薄膜。

Microstructural and Optical Properties of AlxGa1-xN/GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

著录项

相似文献

相关主题

期刊订阅