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METHOD AND DEVICE FOR CHECKING MASKS FOR MICROLITHOGRAPHY
METHOD AND DEVICE FOR CHECKING MASKS FOR MICROLITHOGRAPHY
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机译:显微照相术检查面膜的方法和装置
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摘要
The present invention relates to a method for checking masks for microlithography, in which an aerial image of at least part of the mask is generated and captured by a detection device and compared with a reference image, the comparison of the captured aerial image and reference image by comparing image information along At least one comparison line (6) takes place in the aerial image and reference image, the comparison line (6) running essentially perpendicular to at least one boundary line (4, 5) of a structural element (3) of the mask.
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