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FLUID FLOW AND DEPOSIT ANALYSIS SYSTEMS AND METHOD FOR CHARACTERIZING THE DEPOSIT LEVEL OF A FLUID
FLUID FLOW AND DEPOSIT ANALYSIS SYSTEMS AND METHOD FOR CHARACTERIZING THE DEPOSIT LEVEL OF A FLUID
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机译：表征流体沉积水平的流体流动和沉积分析系统及方法
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摘要
Fluid flow systems can include one or more thermoelectric devices in contact with the fluid flowing through the system. one or more thermoelectric devices can be operated in a temperature control mode and a measurement mode. the thermal behavior of one or more thermoelectric devices can be analyzed to characterize a deposit level formed in the thermoelectric device (s) of the fluid flowing through the system. deposition characterizations in thermoelectric devices operated at different temperatures can be used to establish a temperature-dependent deposition profile. the deposition profile can be used to determine whether depositions are likely to form at various locations in the system, such as in a device of use or in a flow vessel. detected deposit conditions can initiate one or more corrective actions that can be taken to remove deposits or to prevent or minimize the formation of deposits before deposits negatively impact the operation of the system.
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