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METHOD FOR FABRICATING MICROFLUIDIC DEVICES IN FUSED SILICA BY PICOSECOND LASER IRRADIATION
METHOD FOR FABRICATING MICROFLUIDIC DEVICES IN FUSED SILICA BY PICOSECOND LASER IRRADIATION
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机译：激光辐照法制备熔融石英中的微流体装置的方法
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摘要
Method of fabricating a microfluidic device by means of inducing internal cracks in fused silica employing a picosecond laser beam, firstly utilizing irradiation of a focused temporally controlled picosecond laser beam in fused silica to generate a spatially selective modification region including randomly oriented nanocracks, then employing chemical etching to remove the irradiated area and obtain a hollow and connected three-dimensional microstructure, thereby achieving three-dimensional fabrication of microchannel structures inside the fused silica. The method can realize polarization insensitive three-dimensional uniform etching by regulating the pulse width of the picosecond laser beam, and has high chemical etch rate and selectivity, applicable for fabrication of large-sized three-dimensional microfluidic systems, high-precision 3D glass printing, etc.
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