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Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks
Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks
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机译:使用多任务神经网络对光刻后的关键尺寸和蚀刻后的关键尺寸进行共建模
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摘要
A method is presented for constructing a deep neural network based model to concurrently simulate post-lithography critical dimensions (CDs) and post-etch critical dimensions (CDs) and to improve the modeling accuracy of each process respectively. The method includes generating lithographic aerial images of physical design layout patterns, constructing a multi-task neural network including two output channels, training the multi-task neural network with the training data of the lithographic aerial images, and outputting simulated critical dimension values pertaining to lithography and etch processes.
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