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Reaction development image forming method, photosensitive resin composition used in reaction development image forming method, and substrate and structure produced by reaction development image forming method
Reaction development image forming method, photosensitive resin composition used in reaction development image forming method, and substrate and structure produced by reaction development image forming method
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that is usable in a low wavelength region, used in leading-edge lithography, and serves as inexpensive photoresist materials, and a reaction development image forming method and the like using the same.SOLUTION: The present invention provides a photosensitive resin composition used for reaction development image forming method, the composition comprising an alicyclic polycarbonate resin having a constitutional unit represented by formula (1), and a photosensitizer.SELECTED DRAWING: Figure 1
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