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Electron beam diameter control method and electron beam diameter control device for electron beam inspection / length measurement device, and electron beam inspection / length measurement device

机译:用于电子束检查/长度测量装置的电子束直径控制方法和电子束直径控制装置以及电子束检查/长度测量装置

摘要

PROBLEM TO BE SOLVED: To provide a method for controlling a beam diameter for an electron beam inspection/length measurement device, capable of promptly changing an electron beam diameter and electron beam current.SOLUTION: In a method for controlling an electron beam diameter for an electron beam inspection/length measurement device, an aperture plate 9 in which a plurality of apertures A, A, Aare formed with a size corresponding to a convergence half-value angle of an electron beam is provided in an optical path P of an electron beam EP, an electron beam emitted from an electron gun 1 is deflected by deflectors 11-14, and an aperture through which the electron beam passes is selected among the plurality of apertures.SELECTED DRAWING: Figure 2
机译:解决的问题:提供一种用于控制电子束检查/长度测量装置的束直径的方法,该方法能够迅速改变电子束直径和电子束电流。电子束检查/长度测量装置,在电子束的光路P上设置有孔板9,在该孔板9上形成有与电子束的会聚半角对应的大小的多个孔A,A,A。 EP,从电子枪1发射的电子束被偏转器11-14偏转,并从多个孔中选择一个使电子束穿过的孔。图2

著录项

  • 公开/公告号JP6632863B2

    专利类型

  • 公开/公告日2020-01-22

    原文格式PDF

  • 申请/专利号JP20150210231

  • 发明设计人 滝川 忠宏;

    申请日2015-10-26

  • 分类号H01J37/04;H01L21/66;H01J37/28;H01J37/09;H01J37/147;H01J37/20;H01J37/21;G01B15;G01B15/04;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:16

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