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Determining the effect of stochastic behavior on overlay metric data
Determining the effect of stochastic behavior on overlay metric data
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机译:确定随机行为对覆盖指标数据的影响
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摘要
A method is provided for designing a metric target and estimating the uncertainty error of the metric index value with respect to stochastic noise, eg, that of line characteristics (eg, line edge roughness LER). The minimum required dimension of the target element can be derived by CDSEM (critical dimension scanning electron microscopy) or an optical system, with the corresponding target, by analysis of metrological uncertainty errors as well as line characteristics. The finding that reinforces the importance of this analysis is that the more localized models such as CPE (collectable per exposure) can be, the more probabilistic noise can be. Uncertainty error estimation results can be used for target design, overlay estimation enhancement, and metrology reliability assessment in multiple contexts.
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