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APPARATUS AND METHOD OF INVESTIGATING KINETICS OF CHEMICAL REACTIONS AND DETERMINING THERMOPHYSICAL PROPERTIES OF DIFFERENT COMPOUNDS USING GASOMETRIC METHOD
APPARATUS AND METHOD OF INVESTIGATING KINETICS OF CHEMICAL REACTIONS AND DETERMINING THERMOPHYSICAL PROPERTIES OF DIFFERENT COMPOUNDS USING GASOMETRIC METHOD
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机译:用化学方法研究化学反应动力学并测定不同化合物热物理性质的装置和方法
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摘要
FIELD: chemistry.SUBSTANCE: invention is intended to study kinetics of chemical reactions passing with change of amount of gaseous compounds, as well as determining temperature dependences of vapour pressure on temperature, enthalpy and entropy of evaporation, temperatures and critical temperatures of analysed compounds at pressures from 0 to 200 atm and temperatures from 20 to 1000 °C. Method for investigating the kinetics of chemical reactions occurring in solid, liquid or gaseous states with change in the amount of gaseous compounds, as well as determining temperature dependences of vapour pressure on temperature, enthalpy and entropy of evaporation, boiling points and critical temperature of analysed compounds using a gas metering method. Proposed method consists in automatic recording and processing the temperature dependences of vapour pressure of liquid compounds, dependencies of gaseous compound pressures in reaction vessel on time and dependences of rate constants of chemical reactions passing with release of gaseous substances from temperature. At that, in order to determine pressure of gaseous compounds, glass reaction vessel with glass manometric membrane and glass tube for loading of analysed sample is used, wherein glass tube is soldered to tube while membrane tube is soldered at membrane base while glass reaction vessel with tube, glass manometric membrane and glass arrow is fitted in metal pressure compensation chamber.EFFECT: technical result is increase in the information content of the obtained data by creating an apparatus and developing a method of analysing the kinetics of chemical reactions passing with varying the amount of gaseous compounds, as well as determining temperature dependences of vapour pressure on temperature, enthalpy and entropy of evaporation, boiling points and critical temperatures of analysed compounds at pressures from 0 to 200 atm and temperatures from 20 to 1000 °C.2 cl, 7 dwg
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